Title:
ポリオルガノシルセスキオキサン系微粒子及びその製造方法
Document Type and Number:
Japanese Patent JP4756596
Kind Code:
B2
Abstract:
To provide polyorganosilsesquioxane-based fine particles having high water repellency and excellent dispersibility and affinity with various materials without treating the surfaces of isolated polymethylsilsesquioxane fine particles and without using a fluoroalkyl group-containing compound. The polyorganosilsesquioxane-based fine particles are characterized by being obtained by hydrolyzing and condensing Si(OR2)4(R2 is H or an identical or different 1 to 6C alkyl) and (CH3)3SiOR3 and/or [(CH3)3Si]2NH (R3 is H or an identical or different 1 to 6C alkyl) on the surfaces of polyorganosilsesquioxane-based fine particles containing R1SiO3/2 units (R1 is an identical or different 1 to 20C monovalent organic group) in an amount of ≥ 70 mol%, and having a melting point of ≥ 300 DEG C or not having a melting point.
Inventors:
Yoshinori Iguchi
Application Number:
JP2006105533A
Publication Date:
August 24, 2011
Filing Date:
April 06, 2006
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C08G77/44; C08J3/12
Domestic Patent References:
| JP4122731A | ||||
| JP2002097280A | ||||
| JP4258636A | ||||
| JP5013089B2 |
Attorney, Agent or Firm:
Eiichiro Shimazaki
Naotaka Kono
Kanji Arai
Naotaka Kono
Kanji Arai