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Title:
半導体製造プロセスを制御する第1の原理シミュレーションを用いたシステム及び方法。
Document Type and Number:
Japanese Patent JP4795957
Kind Code:
B2
Abstract:
A method, system and computer readable medium for controlling a process performed by a semiconductor processing tool includes inputting data relating to a process performed by the semiconductor processing tool, and inputting a first principles physical model relating to the semiconductor processing tool. First principles simulation is then performed using the input data and the physical model to provide a first principles simulation result, and the first principles simulation result is used to control the process performed by the semiconductor processing tool.

Inventors:
Strang, Eric Jay.
Application Number:
JP2006533873A
Publication Date:
October 19, 2011
Filing Date:
September 20, 2004
Export Citation:
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Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/3065; G06F17/50; H01L21/205; H01L
Domestic Patent References:
JP2003017471A2003-01-17
JP2005515623A2005-05-26
JP2005522018A2005-07-21
JP2004524685A2004-08-12
JP2004531878A2004-10-14
JP2000517473A2000-12-26
JP2005514790A2005-05-19
JP2004527117A2004-09-02
JPH11176906A1999-07-02
JP2002367875A2002-12-20
JP2003502771A2003-01-21
JP2000195766A2000-07-14
Foreign References:
WO2003060779A12003-07-24
WO2003009345A22003-01-30
WO2002065511A22002-08-22
WO2002069063A22002-09-06
WO2003058699A12003-07-17
WO2002077589A22002-10-03
Attorney, Agent or Firm:
Kurata Masatoshi
Satoshi Kono
Makoto Nakamura
Yoshihiro Fukuhara
Takashi Mine
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Kocho Chojiro
Naoki Kono
Katsu Sunagawa
Katsumura Hiro
Tatsushi Sato
Takashi Okada
Mihoko Horiuchi
Takenori Masanori
Takuzo Ichihara
Yamashita Gen



 
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