Title:
ガス分解装置およびそれを用いたプラズマ設備
Document Type and Number:
Japanese Patent JP4796733
Kind Code:
B2
Abstract:
A processing apparatus for subject of the present invention uses a high voltage electrode and a ground electrode, and generates plasma under atmospheric pressure in a reaction passage through which a to-be-processed subject passes. For example, even fluorocompound such as PFC including CF4 can effectively be decomposed because the fluorocompound is brought into contact with plasma in a small space for sufficient time, and the apparatus has a small and simple structure. Therefore, the apparatus can be added to each process chamber.
Inventors:
Ryohei Itaya
Exit Mikio
Rockfish Bencherki
Toshihiko Toda
Heitaro Saka
Toshiaki Ishikawa
Exit Mikio
Rockfish Bencherki
Toshihiko Toda
Heitaro Saka
Toshiaki Ishikawa
Application Number:
JP2001587901A
Publication Date:
October 19, 2011
Filing Date:
May 28, 2001
Export Citation:
Assignee:
Adtech Plasma Technology Co., Ltd.
International Classes:
B01D53/70; B01D53/32; B01D53/46; B01D53/68; B01J3/00; B01J3/02; B01J19/08; C23C14/00; C23C16/44; H01L21/205; H01L21/31; H05H1/24
Domestic Patent References:
| JPH11156156A | 1999-06-15 | |||
| JPH10325A | 1998-01-06 | |||
| JPH0747224A | 1995-02-21 |
Attorney, Agent or Firm:
Shinichi Abe
Yoshihiro Shimizu
Yuji Tsujida
Yoshihiro Shimizu
Yuji Tsujida