Title:
特にマイクロリソグラフィ用の照明光学系
Document Type and Number:
Japanese Patent JP4804704
Kind Code:
B2
Abstract:
The invention concerns an illumination system, particularly for microlithography with wavelengths <=193 nm, comprising a light source, a first optical component, a second optical component, an image plane and an exit pupil. The first optical component transforms the light source into a plurality of secondary light sources being imaged by the second optical component in said exit pupil. The first optical component comprises a first optical element having a plurality of first raster elements, which are imaged into said image plane producing a plurality of images being superimposed at least partially on a field in said image plane. The first raster elements deflect incoming ray bundles with first deflection angles, wherein at least two of the first deflection angles are different. The first raster elements are preferably rectangular, wherein the field is a segment of an annulus. To transform the rectangular images of the first raster elements into the segment of the annulus, the second optical component comprises a first field mirror for shaping the field to the segment of the annulus.
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Inventors:
Martin Antoni
Wolfgang Zinger
Johannes Wangler
Wolfgang Zinger
Johannes Wangler
Application Number:
JP2002530918A
Publication Date:
November 02, 2011
Filing Date:
September 28, 2001
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
H01L21/027; F21V5/00; F21V7/00; F21V13/04; G02B13/18; G02B17/00; G02B17/08; G02B19/00; G03F7/20; G21K1/06; G21K5/00; G21K5/02; G21K5/04
Domestic Patent References:
JP6235797A | ||||
JP7084108A | ||||
JP7094397A | ||||
JP7235472A | ||||
JP7249561A | ||||
JP9050958A | ||||
JP11312638A | ||||
JP2000003858A | ||||
JP2000098619A | ||||
JP2000252208A |
Attorney, Agent or Firm:
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda