Title:
フォトマスクの製造方法及びフォトマスクブランク
Document Type and Number:
Japanese Patent JP4826842
Kind Code:
B2
Inventors:
Shinichi Igarashi
Hero Kaneko
Judge Inazuki
Kazuhiro Nishikawa
Hero Kaneko
Judge Inazuki
Kazuhiro Nishikawa
Application Number:
JP2009006907A
Publication Date:
November 30, 2011
Filing Date:
January 15, 2009
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F1/32; G03F1/54; G03F1/68; G03F1/80; H01L21/027; H01L21/3065
Domestic Patent References:
| JP2007241060A | ||||
| JP2006078807A | ||||
| JP2007292824A | ||||
| JP2001027799A | ||||
| JP2007241065A | ||||
| JP63085553A | ||||
| JP2005292164A | ||||
| JP2004333653A | ||||
| JP7140635A | ||||
| JP2006317665A |
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa