Title:
デュアルステージ交換露光における精確位置決めシステム
Document Type and Number:
Japanese Patent JP4832570
Kind Code:
B2
Abstract:
A precise positioning system for dual stage switching exposure, which includes a base, a first wafer stage positioning unit disposed on the base for a pre-processing workstation, and a second wafer stage positioning unit for an exposure workstation. Each of the wafer stage positioning units includes a wafer stage, a motion positioning detector, an X-direction guide bar, and a Y-direction guide bar. The pre-processing workstation and the exposure workstation both have two X-direction guide bars positioned on and movable along the Y-direction guide bars. The X-direction guide bars of adjacent workstations can be connected to each other.
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Inventors:
Reintion
Li Shaopin
Yan Zi Young
Guan Jun
Gao Xiaowen
Sun Wen Fung
Li Ghan
Tsai Yen Min
Li Shaopin
Yan Zi Young
Guan Jun
Gao Xiaowen
Sun Wen Fung
Li Ghan
Tsai Yen Min
Application Number:
JP2009510257A
Publication Date:
December 07, 2011
Filing Date:
November 20, 2006
Export Citation:
Assignee:
Shanghai Micro Electronics Equipment Company Limited
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
| JP2000511704A | ||||
| JP2006100686A | ||||
| JP2004342638A | ||||
| JP2005294468A |
Attorney, Agent or Firm:
Hiroshi Oue
Haruhiko Otani
Haruhiko Otani