荷電粒子ビーム露光システム

Japanese Patent JP4856073

B2

A charged particle beam exposure apparatus for transferring a pattern onto a surface of a target, comprising a beam generator comprising a plurality of n changed particle sources, substantially in one plane, each source adapted for generating a charged particle beam, a first aperture array, comprising a plurality of groups of apertures, each group of apertures aligned with one source, for splitting each beam up into a plurality of beamlets m, thus resulting in a total of n×m beamlets, and a deflector array, comprising a plurality of groups of deflectors, each group of deflectors aligned with one source and one group of apertures, each deflector in a group aligned with an aperture of the corresponding group, and each group of deflectors operable for asserting a collimating influence on its corresponding beam.

Kuruit, Pieter

JP2007527070A

January 18, 2012

April 29, 2005

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H01L21/027; G03F7/20; H01J37/06; H01J37/08; H01J37/147; H01J37/305; H01J37/317

JPS6039828A	1985-03-01
JPH08222163A	1996-08-30
JPH11224629A	1999-08-17
JPH11317357A	1999-11-16
JPH11329322A	1999-11-30
JP2000252207A	2000-09-14
JP2001052998A	2001-02-23
JP2001267221A	2001-09-28
JP2002175968A	2002-06-21
JP2002334663A	2002-11-22
JP2003016987A	2003-01-17
JP2003332207A	2003-11-21
JP2004134171A	2004-04-30
JP2004303794A	2004-10-28
JP2006520078A	2006-08-31
JP2003324050A	2003-11-14

WO2001075946A1	2001-10-11
WO2001075947A1	2001-10-11
WO2001075948A1	2001-10-11
WO2001075950A1	2001-10-11
WO2001075951A1	2001-10-11
WO2001075949A1	2001-10-11

Satoshi Kono
Makoto Nakamura
Kurata Masatoshi
Takashi Mine
Yoshihiro Fukuhara
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Katsu Sunagawa
Ryo Hashimoto
Tetsuya Kazama

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