3成分膜の新規な堆積方法 - Rail Liquide-Societe Anonym Pools Retude e Rex Prosatation de Procede Georges Claude

Title:

3成分膜の新規な堆積方法

Document Type and Number:

Japanese Patent JP4870759

Kind Code:

B2

Abstract:

Method for producing a metal-containing film by introducing a metal source which does not contain metal-C or metal-N—C s-bonds (for example, TaCl₅, SEt₂), a silicon precursor (for example, SiH(NMe₂)₃ or (SiH₃)₃N), a nitrogen precursor such as ammonia, a carbon source such as monomethylamine or ethylene and a reducing agent (for example, H₂) into a CVD chamber and reacting same at the surface of a substrate to produce metal containing films in a single step.

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Inventors:

Dusara, Christian
Kazutaka Yanagita
Gatineau, Julian

Application Number:

JP2008518643A

Publication Date:

February 08, 2012

Filing Date:

June 29, 2005

Export Citation:

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Assignee:

Rail Liquide-Societe Anonym Pools Retude e Rex Prosatation de Procede Georges Claude

International Classes:

C23C16/34

Domestic Patent References:

JP2005533390A	2005-11-04
JP2001102326A	2001-04-13
JP2001308087A	2001-11-02

Foreign References:

US20040043604A1

2004-03-04

Attorney, Agent or Firm:

Satoshi Kono
Makoto Nakamura
Kurata Masatoshi
Takashi Mine
Yoshihiro Fukuhara
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Katsu Sunagawa
Ryo Hashimoto
Tetsuya Kazama

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