Title:
リソグラフィ装置およびデバイス製造方法
Document Type and Number:
Japanese Patent JP4903769
Kind Code:
B2
Abstract:
In an immersion lithography apparatus, ultrasonic waves are used to atomize liquid on a surface of the substrate.
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Inventors:
Nicolas Rudolf Kempel
Johannes Petrus Maria Sumoylers
Arno Villelem Frederick Volkel
Rene Breuvel
Nicolas Ten Cate
Stephan Philip Cristian Bell Floyd
Johannes Petrus Maria Sumoylers
Arno Villelem Frederick Volkel
Rene Breuvel
Nicolas Ten Cate
Stephan Philip Cristian Bell Floyd
Application Number:
JP2008298670A
Publication Date:
March 28, 2012
Filing Date:
November 21, 2008
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
| JP2005286068A | ||||
| JP2006528835A | ||||
| JP2006165502A | ||||
| JP2006523031A | ||||
| JP11176727A |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Toshifumi Onuki