Title:
高周波プロセッサ内のプラズマ不安定性を最小化するための高周波電磁界供給方法、装置及び高周波電磁界供給装置に用いるメモリ
Document Type and Number:
Japanese Patent JP4948703
Kind Code:
B2
Abstract:
Variable reactances of a matching network connected between an r.f. source and a plasma load of a vacuum plasma chamber processing a workpiece are varied so a tendency of the plasma to change in an unstable manner which can adversely affect processing of the workpiece is avoided while matching is approached. The plasma tendency to change in an unstable manner is detected by monitoring an electrical parameter resulting from r.f. current flowing between the source and load via the network. The parameter can be (1) statistically based, e.g. variance of percent delivered power, or (2) amplitude modulation in one or both of the 2-20 kHz and 50-200 kHz ranges.
Inventors:
Brett Sea Richardson
Tuan Go
Tuan Go
Application Number:
JP2000527961A
Publication Date:
June 06, 2012
Filing Date:
January 08, 1999
Export Citation:
Assignee:
LAM RESEARCH CORPORATION
International Classes:
H05H1/46; H01J37/32; H01L21/302; H01L21/3065
Domestic Patent References:
| JPH03257823A | 1991-11-18 | |||
| JPH0888097A | 1996-04-02 | |||
| JPH09134798A | 1997-05-20 | |||
| JPH09134800A | 1997-05-20 | |||
| JP2003224112A | 2003-08-08 | |||
| JPH09260096A | 1997-10-03 |
Foreign References:
| US5689215A | 1997-11-18 |
Attorney, Agent or Firm:
Seitaka Yoshida