Title:
基材、及び表示装置
Document Type and Number:
Japanese Patent JP4984367
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method of forming a film which makes it possible to obtain the film having low hygroscopicity and a good film sticking property to a substrate and a base material having this film and a display device. SOLUTION: This method forms the film containing at least either one of an O atom and an N atom on the surface of the base material and an Si atom by discharging electricity between electrodes facing each other under the atmosphere pressure or the pressure near the atmosphere pressure to put reactive gas into a plasma state and exposing the base material to the reactive gas of the plasma state. The film formed by this method is <=0.95 in x/(x+y) and is 0.2 to 5 wt.% in carbon content when the ratio of the numbers of the oxygen atom and the nitrogen atom is defined as x:y.
Inventors:
Taketoshi Yamada
Toshio Tsuji
Muramatsu Yuumi
Toshio Tsuji
Muramatsu Yuumi
Application Number:
JP2001303558A
Publication Date:
July 25, 2012
Filing Date:
September 28, 2001
Export Citation:
Assignee:
Konica Minolta Holdings Co., Ltd.
International Classes:
C23C16/42; F21S2/00; G09F9/00; G09F9/30; H01L51/50; H05B33/02; H05B33/04; H05B33/10; H05B33/14; H05B41/00; H05B41/24; H05B41/392
Domestic Patent References:
JP2001181844A | ||||
JP2000336196A | ||||
JP11129382A | ||||
JP2001049443A | ||||
JP2050967A | ||||
JP2002155370A |
Attorney, Agent or Firm:
Gwangyang International Patent Office
Hiroshi Arafune
Hiroshi Arafune
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