Title:
マスクブランク、露光用マスクの製造方法、反射型マスクの製造方法、及びインプリント用テンプレートの製造方法
Document Type and Number:
Japanese Patent JP5009649
Kind Code:
B2
Abstract:
A mask blank includes a substrate and a thin film formed thereon and used to form a pattern. The mask blank is adapted to be subjected to dry etching corresponding to a method of producing an exposure mask by patterning the thin film by dry etching using an etching gas substantially free from oxygen with a resist pattern formed on the thin film used as a mask. The thin film has a protective layer formed at least at its upper layer and containing 60 atomic % or more oxygen. For example, the dry etching is performed by the use of a chlorine-based gas substantially free from oxygen.
More Like This:
Inventors:
Jun Nozawa
Mitsuhiro Kureishi
Mitsuhiro Kureishi
Application Number:
JP2007049084A
Publication Date:
August 22, 2012
Filing Date:
February 28, 2007
Export Citation:
Assignee:
HOYA CORPORATION
International Classes:
G03F1/50; G03F1/54; G03F1/68
Domestic Patent References:
| JP2001312043A | ||||
| JP2006048033A | ||||
| JP2003248292A | ||||
| JP2004006798A | ||||
| JP2006203183A | ||||
| JP2005268750A |
Attorney, Agent or Firm:
Takeshi Otsuka