Title:
最適化方法およびリソグラフィセル
Document Type and Number:
Japanese Patent JP5016662
Kind Code:
B2
Abstract:
Variables in each step in a double patterning lithographic process are recorded and characteristics of intermediate features in a double patterning process measured. The final feature is then modeled, and the values of the variables optimized.
Inventors:
Moss, Everhardas, Cornelis
Findels, Joseph, Maria
Middlebrooks, Scott, Anderson
Wanli, Dongji
Demol, Christianus, Geraldus, Maria
Dusa, Mercy
Findels, Joseph, Maria
Middlebrooks, Scott, Anderson
Wanli, Dongji
Demol, Christianus, Geraldus, Maria
Dusa, Mercy
Application Number:
JP2009280123A
Publication Date:
September 05, 2012
Filing Date:
December 10, 2009
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
H01L21/027; H01L21/3065
Domestic Patent References:
| JP2008053687A | ||||
| JP2010501120A | ||||
| JP2007519981A | ||||
| JP2008085330A | ||||
| JP2009530668A |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Toshifumi Onuki