Title:
リソグラフィ装置およびデバイスの製造方法
Document Type and Number:
Japanese Patent JP5022338
Kind Code:
B2
Abstract:
A system and method are used to form features on a substrate. The system and method include using a first array including individually controllable elements that selectively pattern a beam of radiation, a second array including sets of lenses and apertures stops that form an image from a respective one of the individually controllable elements in a first plane, a third array including lenses that form an image from a respective one of the second array in a second plane, and a substrate table that holds a substrate in the second plane, such that the substrate receives the image from the respective one of the second array. A same spacing is formed between elements in the first, second, and third arrays.
Inventors:
Chen-Kung Guy
Application Number:
JP2008288623A
Publication Date:
September 12, 2012
Filing Date:
November 11, 2008
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
G03F7/20; H01L21/027; G02B3/00; G03B27/42; G03B27/54
Domestic Patent References:
| JP2003337427A | ||||
| JP2001290096A | ||||
| JP2005062847A | ||||
| JP2004056100A |
Attorney, Agent or Firm:
Sakaki Morishita