Title:
マイクロリソグラフィツール用の反射照明システム
Document Type and Number:
Japanese Patent JP5077724
Kind Code:
B2
Abstract:
In general, in one aspect, the invention features a system that includes an illumination system of a microlithography tool, the illumination system including a first component having a plurality of elements. During operation of the system, the elements direct radiation from a source along an optical path to an arc-shaped object field at an object plane of a projection objective, and at least one of the elements has a curved shape that is different from the arc-shape of the object field.
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Inventors:
Ottoman Jens
Entres Martin
Stutz Ralph
Entres Martin
Stutz Ralph
Application Number:
JP2010510893A
Publication Date:
November 21, 2012
Filing Date:
June 07, 2007
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
H01L21/027; G02B5/10; G02B19/00
Domestic Patent References:
| JP2002343695A | ||||
| JP2006216917A | ||||
| JP2000162416A |
Foreign References:
| WO2006082738A1 |
Attorney, Agent or Firm:
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi