Title:
ペリクル、方法(NAが1より大きい液浸リソグラフィ・システム用に最適化されたペリクル被膜)
Document Type and Number:
Japanese Patent JP5078626
Kind Code:
B2
Abstract:
An optical pellicle to protect a photomask from particulate contamination during semiconductor lithography is provided which has enhanced transparency and operational characteristics. The pellicle utilizes alternating layers of a transparent polymer and a transparent inorganic layer to form pellicles which have high transmission properties and high strength. In a preferred pellicle, a three-layer pellicle is provided having a transparent inorganic layer sandwiched between two polymer layers. A five-layer pellicle is also provided with the outer layers and a middle layer being polymer layers and the inner layers an inorganic material. The preferred polymer layer is a perfluorinated polymer such as Teflon(R) and the preferred inorganic material is silicon dioxide. The pellicle of the invention provides light transmission of greater than 0.99% at incident light angles up to arcsine 0.45.
Inventors:
Timothy Alan Brunner
Michael straight hibbs
Michael straight hibbs
Application Number:
JP2008001453A
Publication Date:
November 21, 2012
Filing Date:
January 08, 2008
Export Citation:
Assignee:
INTERNATIONAL BUSINESS MASCHINES CORPORATION
International Classes:
G03F1/62; H01L21/027
Domestic Patent References:
| JP61209449A | ||||
| JP63284551A | ||||
| JP2158735A | ||||
| JP5043238A | ||||
| JP6230560A | ||||
| JP9161967A | ||||
| JP2001154340A | ||||
| JP2003514955A | ||||
| JP2008040469A |
Attorney, Agent or Firm:
Takeshi Ueno
Tasaichi Tanae
Yoshihiro City
Hiroshi Sakaguchi
Tasaichi Tanae
Yoshihiro City
Hiroshi Sakaguchi