Title:
表面洗浄方法及び装置
Document Type and Number:
Japanese Patent JP5122662
Kind Code:
B2
Abstract:
Methods and apparatus for creating and controlling transient cavitation are disclosed. An example method includes selecting a range of bubble sizes to be created in a liquid and selecting characteristics for an acoustic field to be applied to the liquid. The method further includes creating gas bubbles of the selected range of bubble sizes in the liquid, creating an acoustic field with the selected characteristics and subjecting the liquid to the acoustic field. In the example method, at least one of the range of bubble sizes and the characteristics of the acoustic field is selected in correspondence with the other so as to control transient cavitation in the liquid for the selected range of bubble sizes. Particularly, the methods and apparatus may be used for the cleaning of a surface, such as a semiconductor substrate.
Inventors:
Frank Holsteins
Lee Kuntuck
Lee Kuntuck
Application Number:
JP2011037788A
Publication Date:
January 16, 2013
Filing Date:
February 24, 2011
Export Citation:
Assignee:
IMEC
Samsung Electronics Co.,Ltd.
Samsung Electronics Co.,Ltd.
International Classes:
B08B3/10; B01F1/00; B01F3/04; B01F5/02; B01F5/06; B01F15/06; B08B3/12; H01L21/304
Domestic Patent References:
| JP6320124A | ||||
| JP61015334A | ||||
| JP8299928A | ||||
| JP2000303093A |
Attorney, Agent or Firm:
Takuji Yamada
Mitsuo Tanaka
Mikio Takeuchi
Mitsuo Tanaka
Mikio Takeuchi
Previous Patent: JPS5122661
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