Title:
微細パターンの形成方法
Document Type and Number:
Japanese Patent JP5156086
Kind Code:
B2
Abstract:
There is provided a micro pattern forming method including forming a thin film on a substrate; forming a film serving as a mask when processing the thin film; processing the film serving as a mask into a pattern including lines having a preset pitch; trimming the pattern including the lines; and forming an oxide film on the pattern including the lines and on the thin film by alternately supplying a source gas and an activated oxygen species. Here, the process of trimming the pattern and the process of forming an oxide film are consecutively performed in a film forming apparatus configured to form the oxide film.
Inventors:
Shigeru Nakajima
Kazuhide Hasebe
Zhou Hohua
Mitsuaki Iwashita
Reiji Shinno
Kazuhide Hasebe
Zhou Hohua
Mitsuaki Iwashita
Reiji Shinno
Application Number:
JP2010289449A
Publication Date:
March 06, 2013
Filing Date:
December 27, 2010
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/027; H01L21/3065; H01L21/316
Domestic Patent References:
| JP200480033A | ||||
| JP200345968A | ||||
| JP200168462A | ||||
| JP8195384A | ||||
| JP11135628A | ||||
| JP62259445A | ||||
| JP2008240077A | ||||
| JP2008174842A | ||||
| JP2007537360A | ||||
| JP2007154297A |
Attorney, Agent or Firm:
Hiroshi Takayama