To provide a film-forming device for uniformalizing the shape of a thin film in a whole thin-film-forming area, in case the thin film is formed on a substrate.
The device includes a chamber 210 housing the substrate 9, a first exhaust port 211 fitted to an upper wall face of the chamber 210, a second exhaust port 212 fitted to a lower wall face of the chamber 210 at a position opposed to the first exhaust port 211, a first decompression means connected to the first exhaust port 211 for decompressing and exhausting the inside of the chamber 210, a first regulating valve fitted between the first exhaust port 211 and the first decompression means for regulating exhaust velocity from the first exhaust port 211, a second decompression means connected to the second exhaust port 212 for decompressing and exhausting the inside of the chamber 210, a second regulating valve fitted between the second exhaust port 212 and the second decompression means for regulating exhaust velocity from the second exhaust port 212, and a control part controlling the first regulating valve and the second regulating valve each independently to regulate exhaust velocity each of the first exhaust port 211 and the second exhaust port 212.
COPYRIGHT: (C)2010,JPO&INPIT
Mari Sakai
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