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Patent Searching and Data


Title:
レジスト下層膜形成用組成物
Document Type and Number:
Japanese Patent JP5177137
Kind Code:
B2
Inventors:
能村 仲篤
今野 洋助
Application Number:
JP2009515266A
Publication Date:
April 03, 2013
Filing Date:
May 21, 2008
Export Citation:
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Assignee:
JSR株式会社
International Classes:
G03F7/11; C08F232/08
Domestic Patent References:
JP2002047430A
JP2006341590A2006-12-21
JP2007241259A
Foreign References:
WO2006132088A1
Attorney, Agent or Firm:
渡邉 一平
木川 幸治
菅野 重慶
佐藤 博幸
小池 成