Title:
フーリエ光学系を含む照明系
Document Type and Number:
Japanese Patent JP5238879
Kind Code:
B2
Abstract:
An illumination system for a microlithography projection exposure apparatus for illuminating an illumination field with the light from a primary light source has a variably adjustable pupil shaping unit for receiving light from the primary light source and for generating a variably adjustable two-dimensional intensity distribution in a pupil shaping surface of the illumination system. The pupil shaping unit has a Fourier optical system for converting an entrance beam bundle entering through an entrance plane of the Fourier optical system into an exit beam bundle exiting from an exit plane of the Fourier optical system. The Fourier optical system has a focal length fFOS and a structural length L measured between an entrance-side first system surface and an exit-side last system surface along an optical axis, where (L/fFOS)<1/6.
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Inventors:
Schwab Marx
Rai Michael
Degunter Marx
Haegele Artur
Rai Michael
Degunter Marx
Haegele Artur
Application Number:
JP2011507808A
Publication Date:
July 17, 2013
Filing Date:
April 17, 2009
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
H01L21/027; G02B3/00; G02B13/00; G02B13/18; G02B19/00; G03F7/20
Domestic Patent References:
| JP2007505488A | ||||
| JP10123418A | ||||
| JP11160625A | ||||
| JP10282428A |
Foreign References:
| WO2005062350A1 |
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi