Title:
超純水製造システムの洗浄殺菌方法
Document Type and Number:
Japanese Patent JP5287713
Kind Code:
B2
Abstract:
In a method of cleaning and sterilizing an ultrapure water manufacturing system including an ultrapure water manufacturing apparatus, a point of use of ultrapure water, and an ultrapure water channel connecting the ultrapure water manufacturing apparatus and the point of use, a cleaning and sterilizing process including an alkali cleaning step for cleaning at least part of the inside of the system with alkaline solution and a sterilizing step for sterilizing the system with sterile water after the alkali cleaning is treated twice or more. By treating the cleaning and sterilizing process twice or more, metals, organic substances, particles, and bacteria inside the ultrapure water manufacturing system can be highly efficiently removed, and thereby ultrapure water satisfying required water quality can be produced within a short period of time after the cleaning and sterilizing.
Inventors:
Ikenori Yokoi
Application Number:
JP2009509159A
Publication Date:
September 11, 2013
Filing Date:
March 27, 2008
Export Citation:
Assignee:
Kurita Water Industries Ltd.
International Classes:
C02F1/50; A61L2/04; A61L2/18; B08B3/08; C02F1/72; H01L21/304
Domestic Patent References:
| JP2002192162A | 2002-07-10 | |||
| JP2004267864A | 2004-09-30 | |||
| JP2000317413A | 2000-11-21 | |||
| JP2002166283A | 2002-06-11 | |||
| JP2004275881A | 2004-10-07 | |||
| JPH07299126A | 1995-11-14 | |||
| JP2006297180A | 2006-11-02 | |||
| JP2002052322A | 2002-02-19 |
Attorney, Agent or Firm:
Tsuyoshi Shigeno
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