Title:
ステージ装置、露光装置、方法、露光方法、及びデバイス製造方法
Document Type and Number:
Japanese Patent JP5309565
Kind Code:
B2
Abstract:
A wafer stage (WST) and a measurement stage (MST) are configured so that they are movable along an upper surface of a base plate (21), and water (Lq) is transferred therebetween by bringing the stages proximate to one another and moving them integrally in the Y directions. An alignment system (45) measures mutually proximate edge parts of the wafer stage (WST) and the measurement stage (MST), and a focus leveling detection system (64) measures a step in the Z directions in a state wherein the wafer stage (WST) and the measurement stage (MST) are proximate to one another. When both stages are brought proximate to one another, the relative position between the wafer stage (WST) and the measurement stage (MST) is adjusted based on the measurement results.
Inventors:
Yuichi Shibasaki
Application Number:
JP2007529538A
Publication Date:
October 09, 2013
Filing Date:
August 03, 2006
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
H01L21/027; H01L21/68
Domestic Patent References:
| JP2005019864A | 2005-01-20 | |||
| JP2006135165A | 2006-05-25 | |||
| JP2005019864A | 2005-01-20 | |||
| JP2006135165A | 2006-05-25 |
Foreign References:
| WO2004090577A2 | 2004-10-21 |
Attorney, Agent or Firm:
Masatake Shiga
Tadashi Takahashi
Kazuya Nishi
Tadashi Takahashi
Kazuya Nishi