Title:
成膜速度が速いアーク式蒸発源、このアーク式蒸発源を用いた皮膜の製造方法及び成膜装置
Document Type and Number:
Japanese Patent JP5318052
Kind Code:
B2
Abstract:
Disclosed is an arc evaporation source having fast film-forming speed. The disclosed arc evaporation source (1) is provided with: at least one circumference magnet (3) which surrounds the circumference of a target (2), and which is arranged so that the magnetization direction of the magnet runs along the direction orthogonal to the surface of the target (2); a non-ring shaped first permanent magnet (4A) which is arranged on the rear surface side of the target (2), has polarity in the same direction as the polarity of the circumference magnet (3), and is arranged so that the magnetization direction thereof runs along the direction orthogonal to the surface of the target (2); a non-ring shaped second permanent magnet (4B) which is arranged either on the rear surface side of the first permanent magnet (4A) or between the first permanent magnet (4A) and the target (2), so as to leave a gap from the first permanent magnet (4A), and which has polarity in the same direction as the polarity of the circumference magnet (3), and is arranged so that the magnetization direction thereof runs along the direction orthogonal to the surface of the target (2); and a magnetic body (5) which is arranged between the first permanent magnet (4A) and the second permanent magnet (4B).
Inventors:
Shinichi Tanifuji
Kenji Yamamoto
Nomura Honor
Yoshinori Kurokawa
Naoyuki Goto
Kenji Yamamoto
Nomura Honor
Yoshinori Kurokawa
Naoyuki Goto
Application Number:
JP2010201946A
Publication Date:
October 16, 2013
Filing Date:
September 09, 2010
Export Citation:
Assignee:
KABUSHIKI KAISHA KOBE SEIKO SHO
International Classes:
C23C14/24
Domestic Patent References:
| JP2009144236A | ||||
| JP63000446U | ||||
| JP62207863A | ||||
| JP2006249527A |
Attorney, Agent or Firm:
Toshio Yasuda
Mikio Yasuda
Mikio Yasuda