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Title:
露光方法及び装置、照明光学装置、並びにデバイス製造方法
Document Type and Number:
Japanese Patent JP5333429
Kind Code:
B2
Abstract:
An exposure method and apparatus for simultaneously transferring patterns with various pitches with high resolution. On the pupil surface of an illumination system, nine areas are set. The nine areas are a first area (28) including the optical axis (BX), four second areas (29A to 29D) each smaller than the first area and arranged along a first circumference (32A) surrounding the first area (28), and four third areas (30A to 30D) each smaller than the first area and arranged along a second circumference (32B) surrounding the first circumference (32A) and arranged along a second circumference. The distribution of intensity of light over the pupil surface is so set that the intensities of light over the nine areas are approximately equal to one another, and the intensity of light over the other area is smaller than those over the nine areas. This distribution of intensity of light is set using a diffraction optical element or a diaphragm.

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Inventors:
Kudo Taketo
Shigeru Hirukawa
Application Number:
JP2010286303A
Publication Date:
November 06, 2013
Filing Date:
December 22, 2010
Export Citation:
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Assignee:
NIKON CORPORATION
International Classes:
H01L21/027; G02B5/04; G02B19/00; G03F7/20
Domestic Patent References:
JP2002231619A
JP6053120A
JP10208993A
JP5160002A
JP6267825A
JP5217840A
JP7147223A
JP6163350A
JP8335552A
JP7220995A
JP2000311853A
JP2002261004A
Foreign References:
WO2000011706A1
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yoshiki Kuroki