Title:
照明光学装置及び投影露光装置
Document Type and Number:
Japanese Patent JP5333528
Kind Code:
B2
Abstract:
An illumination optical apparatus and projection exposure apparatus capable of reducing a light quantity loss when a mask is illuminated with a polarized illumination light. An illumination optical system (ILS) for illuminating a reticle (R) with an illumination light (IL) and a projection optical system (PL) for projecting the pattern image of the reticle (R) onto a wafer (W) are provided. An illumination light (IL) emitted from an exposure light source (1) in a linearly polarized state in the illumination optical system (ILS) passes through first and second birefringent members (12, 13) having different fast axis directions and is converted into a polarized state that is substantially linearly polarized in a circumferential direction with the optical axis as the center in an almost specific annular area, and them illuminates the reticle (R) under an annular illuminating condition after passing through a fly-eye lens (14).
Inventors:
Naomasa Shiraishi
Application Number:
JP2011138703A
Publication Date:
November 06, 2013
Filing Date:
June 22, 2011
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
H01L21/027; G02B19/00; G03F7/20
Domestic Patent References:
| JP2004103746A |
Foreign References:
| WO2001035451A1 | ||||
| WO2003003429A1 | ||||
| WO2001023935A1 | ||||
| WO2005005694A1 |
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yoshiki Kuroki
Yoshiki Kuroki