Title:
荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法
Document Type and Number:
Japanese Patent JP5350523
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a drawing apparatus and method in which a global position error is corrected highly accurately.SOLUTION: A drawing apparatus 100 comprises an electron gun 201 which radiates electron beams 200, an XY stage 105 on which a sample 101 is placed, a main deflection arithmetic unit 114 which corrects a reference position of an SF within a drawing area of the sample 101 to be a drawing target on the basis of pattern distortion obtained from positions of a plurality of graphics which are distributed over all the surface of the drawing area of a dummy sample and are drawn without being corrected, a main deflector 214 which deflects the electron beams 200 on the basis of a corrected reference position, a sub deflection arithmetic unit 112 which corrects a relative distance from the corrected reference position to any arbitrary position within a small area using a coefficient of a correction expression for correcting the reference position on the basis of the pattern distortion of the dummy sample and using the reference position, and a sub deflector 212 which further deflects the electron beams 200 from the position deflected by the main deflector 214 on the basis of the corrected relative distance.
Inventors:
Takayuki Abe
Application Number:
JP2012188452A
Publication Date:
November 27, 2013
Filing Date:
August 29, 2012
Export Citation:
Assignee:
New Flare Technology Co., Ltd.
International Classes:
H01L21/027; H01J37/305
Domestic Patent References:
| JP58114425A | ||||
| JP5021323A | ||||
| JP8097120A |
Attorney, Agent or Firm:
Tetsuma Ikegami
Akira Sudo
Mitsuyuki Matsuyama
Akira Sudo
Mitsuyuki Matsuyama