Title:
リソグラフィ装置及び放射コレクタと照明システムの一部分とをアライメントする方法
Document Type and Number:
Japanese Patent JP5377641
Kind Code:
B2
Abstract:
A lithographic apparatus (2) can include a radiation source (SO) configured to provide radiation (200), a radiation collector (CO) configured to collect radiation (200) from the radiation source (SO), an illumination system (IL), and a detector (300). The detector (300) can be disposed in a fixed positional relationship with the illumination system (IL) relative to an alignment of the collector (CO). Further, a region (310) of the collector (CO) can be configured to direct a portion of radiation (200) emanating from the radiation source (SO) and traversing the region (310) towards the detector (300). The detector (300) can be configured to detect a change in a portion of the radiation (200). The change can be indicative of a change in position or orientation of the collector (CO) relative to the illumination system (IL) relative to an alignment of the collector (CO).
Inventors:
Michel, Classen
Van Schoat, Jean
Dutertre, Sylvan
Van Schoat, Jean
Dutertre, Sylvan
Application Number:
JP2011520417A
Publication Date:
December 25, 2013
Filing Date:
July 15, 2009
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
H01L21/027; G02B7/198; G02B19/00
Domestic Patent References:
| JP2007142361A | ||||
| JP2005294087A | ||||
| JP2006501660A | ||||
| JP2006203135A | ||||
| JP2007306004A |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Toshifumi Onuki