Title:
有機多孔質ポリマー材料及びその合成方法
Document Type and Number:
Japanese Patent JP5380535
Kind Code:
B2
Abstract:
The present invention relates to a porous polymer and a synthetic method thereof. The porous polymer has the following general formula:
€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒA = C, Si, N + , P + , B -
wherein, the positions marked with the numeral 1-10 are C, CH, N, or CH with its H being substituted by methyl, ethyl, amido, carboxyl, methoxyl, hydroxyl, or ester group; the positions marked with letter a or b are C, N+, or B - .
Inventors:
Kyu, Sirun
Ju, Guang Shan
Ben, Ten
Ju, Guang Shan
Ben, Ten
Application Number:
JP2011520316A
Publication Date:
January 08, 2014
Filing Date:
November 11, 2009
Export Citation:
Assignee:
Shen Zhen Poremat Technology Company Limited
International Classes:
C08G61/10; C08G61/12
Domestic Patent References:
| JP2005060626A | ||||
| JP2005232211A | ||||
| JP2006104295A | ||||
| JP2001332543A |
Other References:
SHENGWEN YUAN et al.,Nanoporous Polymers Containing Stereocontorted Cores for Hydrogen Storage,Macromolecules,2009年 2月13日,Vol.42,p.1554-1559
Marcus Rose et al.,Element-organic fameworks with high permanent porosity,Cem. Commun.,2008年,p.2462-2464
Ev Stockel et al.,High surface area amorphous microporous poly(aryleneethynylene) networks using tetrahedral carbon- and silicon-centred monomers,Chem.Commun.,2009年,p.212-214
Marcus Rose et al.,Element-organic fameworks with high permanent porosity,Cem. Commun.,2008年,p.2462-2464
Ev Stockel et al.,High surface area amorphous microporous poly(aryleneethynylene) networks using tetrahedral carbon- and silicon-centred monomers,Chem.Commun.,2009年,p.212-214
Attorney, Agent or Firm:
Hatta International Patent Corporation
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