Title:
極端紫外光光源装置
Document Type and Number:
Japanese Patent JP5426317
Kind Code:
B2
Abstract:
An extreme ultraviolet light source apparatus has a magnetic field generator which generates a magnetic field region around a direction of the magnetic field passing through a plasma region in which a plasma is to be generated and converges charged particles including ion emitted from the plasma region toward the direction of the magnetic field, a first charged particle collector (receiver) mounted at both sides of an axis of the magnetic field in the magnetic field region in order to collect (receive) the charged particles converged by the magnetic field, a target supply unit supplying a target from a nozzle located outside a converging region in which the charged particles are to be converged inside the magnetic field region in an extreme ultraviolet light generating chamber, and a target collector located at a position opposite to the nozzle, the target retrieval portion retrieving a residual target which does not contribute to generation of the plasma.
Inventors:
Shinji Nagai
Takanobu Ishihara
Koji Kakizaki
Abe Tamotsu
Takanobu Ishihara
Koji Kakizaki
Abe Tamotsu
Application Number:
JP2009242868A
Publication Date:
February 26, 2014
Filing Date:
October 21, 2009
Export Citation:
Assignee:
Gigaphoton Co., Ltd.
International Classes:
H01L21/027; H05G2/00
Domestic Patent References:
JP2007273239A | ||||
JP2006013033A | ||||
JP2006080255A | ||||
JP2009506517A | ||||
JP2008218600A | ||||
JP2007207574A | ||||
JP2008016753A | ||||
JP2008041436A | ||||
JP2005197456A | ||||
JP2010123929A | ||||
JP2012502492A | ||||
JP2010045357A |
Attorney, Agent or Firm:
Hiroaki Sakai
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