Title:
化粧料
Document Type and Number:
Japanese Patent JP5483928
Kind Code:
B2
Inventors:
Seiji Matsukawa
Yosuke Haneda
Shigeru Sawaki
Shigeru Sawaki
Yosuke Haneda
Shigeru Sawaki
Shigeru Sawaki
Application Number:
JP2009122949A
Publication Date:
May 07, 2014
Filing Date:
May 21, 2009
Export Citation:
Assignee:
Kyoei Chemical Industry Co., Ltd.
International Classes:
A61K8/97; A61K8/9728; A61K8/9789; A61K8/99; A61K35/74; A61K35/742; A61K35/744; A61K36/00; A61K36/06; A61K36/062; A61K36/25; A61P17/00; A61P17/16; A61P17/18; A61Q1/02; A61Q1/12; A61Q5/00; A61Q5/02; A61Q5/12; A61Q19/00; A61Q19/02; A61Q19/08; A61Q19/10; A61K125/00
Domestic Patent References:
| JP2005145897A | ||||
| JP7274977A | ||||
| JP2002348245A | ||||
| JP2006069967A | ||||
| JP2004049154A | ||||
| JP2005531533A | ||||
| JP2001151663A | ||||
| JP2003306442A |
Foreign References:
| CN1124766A |
Other References:
Compound K induces expression of hyaluronan synthase 2 gene in transformed human keratinocytes and increases hyaluronan in hairless mouse skin,Biochemical and Biophysical Research Communications,2004年 4月 2日,Vol.316,Page.348-355