Title:
マイクロリソグラフィ投影露光装置においてマスクを照明するための照明系
Document Type and Number:
Japanese Patent JP5525608
Kind Code:
B2
Abstract:
An illumination system for illuminating a mask in a microlithographic projection exposure apparatus includes an array of mirrors or other beam deflecting elements. Each beam deflecting element produces on the surface a projection light spot at a position that is variable by changing a deflection angle produced by the beam deflecting element. A spot shape measuring unit measures the shapes of spots which are produced on the spot measuring unit by the beam deflecting elements. The spot shape measuring unit is arranged outside of every possible path projection light is allowed to take between the array and the mask. A control unit controls the beam deflecting elements such that, at a given instant during an exposure operation of the apparatus, at least one beam deflecting element directs projection light exclusively on the spot shape measuring unit, and at least some beam deflecting elements direct projection light exclusively on the surface.
Inventors:
Mayor Andras
Application Number:
JP2012519907A
Publication Date:
June 18, 2014
Filing Date:
June 23, 2010
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
H01L21/027; G02B19/00; G03F7/20
Domestic Patent References:
| JP2010518595A | ||||
| JP2005502914A | ||||
| JP2008091907A | ||||
| JP2011507292A | ||||
| JP2009158959A | ||||
| JP2002353105A |
Foreign References:
| WO2008095695A2 |
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi