Title:
マイクロリソグラフィ露光装置のマスク照明用の照明系
Document Type and Number:
Japanese Patent JP5554245
Kind Code:
B2
Abstract:
A diffractive optical element (156) is configured to be inserted into a light beam path of an illumination system (112) of a microlithographic projection exposure apparatus (10) such that it produces a desired intensity distribution in a system pupil surface (154) of the illumination system, wherein a Fourier transform of an angular distribution produced by the diffractive optical element (156) differs from the desired intensity distribution.
Inventors:
Schubert Ehrlich
Call Alexander
G -- querelle Gerhard * Wilhelm
パトラ Michael
デグンテル Marcus
Rye Michael
Call Alexander
G -- querelle Gerhard * Wilhelm
パトラ Michael
デグンテル Marcus
Rye Michael
Application Number:
JP2010538425A
Publication Date:
July 23, 2014
Filing Date:
December 13, 2008
Export Citation:
Assignee:
The Carl Zeiss EMT ゲーエムベーハー
International Classes:
H01L21/027; G02B5/32; G02B19/00; G03F7/20
Attorney, Agent or Firm:
辻居 Koichi
Sadao Kumakura
Fumiaki Otsuka
Takayoshi Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Sadao Kumakura
Fumiaki Otsuka
Takayoshi Nishijima
Hiroyuki Suda
Hiroshi Uesugi