Title:
特にマイクロリソグラフィ投影露光装置の光学系
Document Type and Number:
Japanese Patent JP5566501
Kind Code:
B2
Abstract:
The invention relates to an optical system, in particular of a microlithographic projection exposure apparatus, with a polarization-influencing optical arrangement. In accordance with one aspect of the invention, this polarization-influencing optical arrangement comprises: at least one polarization-influencing optical element, which consists of an optically active material with an optical crystal axis and has a thickness profile that varies in the direction of this optical crystal axis, at least one lambda/2 plate; at least one rotator, which causes a rotation of the polarization direction of light incident on the rotator about a constant polarization rotation angle, and an actuator apparatus, by which the lambda/2 plate and the rotator can be moved independently of one another between a position within the optical beam path and a position outside of the optical beam path.
Inventors:
Ingo Zenger
Application Number:
JP2013097929A
Publication Date:
August 06, 2014
Filing Date:
April 16, 2013
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
H01L21/027; G02B5/30; G02B19/00; G03F7/20
Domestic Patent References:
| JP2003532281A | ||||
| JP2007527549A | ||||
| JP2008047673A |
Foreign References:
| WO2011154227A1 | ||||
| WO2005071718A1 | ||||
| WO2005076045A1 |
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Nobuyuki Taniguchi
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Nobuyuki Taniguchi