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Title:
リソグラフィ装置およびリソグラフィ方法
Document Type and Number:
Japanese Patent JP5574549
Kind Code:
B2
Abstract:
A lithographic apparatus includes an illumination system, a patterning device, and a projection system. The illumination system provides a radiation beam. The patterning device imparts the radiation beam with a pattern in its cross-section. The substrate holder holds a substrate. The projection system projects the patterned radiation beam onto a target portion of the substrate. The apparatus is constructed and arranged, at least in use, to image a pattern on to the substrate using radiation having: a bright field intensity distribution in a first direction; and a dark field intensity distribution in second direction, substantially perpendicular to the first direction.

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Inventors:
Mulder, Heine, Mairet
Hansen, Stephen, George
ホリンク, ティス, Jovan, Henry
Application Number:
JP2012167153A
Publication Date:
August 20, 2014
Filing Date:
July 27, 2012
Export Citation:
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Assignee:
ASML Nether ランズ B. buoy.
International Classes:
H01L21/027; G02B19/00; G03F7/20
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki



 
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