Title:
マイクロリソグラフィ投影露光装置の照明系
Document Type and Number:
Japanese Patent JP5611443
Kind Code:
B2
Abstract:
An illumination system of a microlithographic projection exposure apparatus includes a light source to produce projection light beam, and a first and a second diffractive optical element between the light source and a pupil plane of the illumination system. The diffractive effect produced by each diffractive optical element depends on the position of a light field that is irradiated by the projection light on the diffractive optical elements. A displacement mechanism changes the mutual spatial arrangement of the diffractive optical elements. In at least one of the mutual spatial arrangements, which can be obtained with the help of the displacement mechanism, the light field extends both over the first and the second diffractive optical element. This makes it possible to produce in a simple manner continuously variable illumination settings.
Inventors:
パトラ ミヒャエル
ビーリング スティグ
デギュンター マルクス
シュレーゼナー フランク
シュワブ マルクス
ビーリング スティグ
デギュンター マルクス
シュレーゼナー フランク
シュワブ マルクス
Application Number:
JP2013500340A
Publication Date:
October 22, 2014
Filing Date:
December 28, 2010
Export Citation:
Assignee:
カール・ツァイス・エスエムティー・ゲーエムベーハー
International Classes:
H01L21/027; G02B5/18; G02B19/00; G03F7/20
Attorney, Agent or Firm:
辻居 Koichi
Sadao Kumakura
Fumiaki Otsuka
Takayoshi Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Shore Yoshinori
Sadao Kumakura
Fumiaki Otsuka
Takayoshi Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Shore Yoshinori