Title:
蒸着フィルム
Document Type and Number:
Japanese Patent JP5613418
Kind Code:
B2
Abstract:
Disclosed is a vapor deposition film wherein a vapor deposition layer composed of a metal or an inorganic oxide is formed on at least one side of a resin layer (A) which is composed of a resin composition (1). The resin composition (1) is a polyglycol acid containing not less than 70% by mole of a specific structure (a structure represented by formula (1)) as a repeating unit. The surface on which the vapor deposition layer is deposited has a center line average roughness of 5-50 nm. The vapor deposition film has excellent gas barrier properties, excellent workability and decomposition resistance sufficient for practical use.
Inventors:
山村 剛平
角 沙織
木村 将弘
阿部 俊輔
佐藤 卓
佐藤 浩幸
増田 順一
新沼 舘浩
角 沙織
木村 将弘
阿部 俊輔
佐藤 卓
佐藤 浩幸
増田 順一
新沼 舘浩
Application Number:
JP2009553347A
Publication Date:
October 22, 2014
Filing Date:
June 12, 2009
Export Citation:
Assignee:
東レ株式会社
株式会社クレハ
株式会社クレハ
International Classes:
B32B27/36; B32B9/04; B65D65/40; B65D81/24
Domestic Patent References:
| JP2005053223A | 2005-03-03 | |||
| JP2004168040A | 2004-06-17 | |||
| JPH1142752A | 1999-02-16 | |||
| JP2006130847A | 2006-05-25 | |||
| JP2001038867A | 2001-02-13 | |||
| JP2001310412A | 2001-11-06 | |||
| JPH11320794A | 1999-11-24 | |||
| JP2005053223A | 2005-03-03 |
Attorney, Agent or Firm:
伴 Toshimitsu
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