Title:
単量体、高分子化合物、レジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP5644788
Kind Code:
B2
Abstract:
A polymer is prepared from an adamantane methacrylate monomer whose alcoholic hydroxyl group is protected with an alicyclic-containing tertiary alkyl group. A photoresist composition comprising the polymer displays a high sensitivity and a high dissolution contrast during both alkaline development and organic solvent development.
Inventors:
提箸 正義
畠山 潤
長谷川 幸士
片山 和弘
畠山 潤
長谷川 幸士
片山 和弘
Application Number:
JP2012026798A
Publication Date:
December 24, 2014
Filing Date:
February 10, 2012
Export Citation:
Assignee:
信越化学工業株式会社
International Classes:
C08F20/10; C07C69/533; C07C69/54; C08L33/06; G03F7/038; G03F7/039; G03F7/32; H01L21/027
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa