Title:
プラズマ処理チャンバで用いるための真空ギャップを備えたプラズマ対向プローブ装置
Document Type and Number:
Japanese Patent JP5661622
Kind Code:
B2
Abstract:
An arrangement for measuring process parameters within a processing chamber is provided. The arrangement includes a probe arrangement disposed in an opening of an upper electrode. Probe arrangement includes a probe head, which includes a head portion and a flange portion. The arrangement also includes an o-ring disposed between the upper electrode and the flange portion. The arrangement further includes a spacer made of an electrically insulative material positioned between the head portion and the opening of the upper electrode to prevent the probe arrangement from touching the upper electrode. The spacer includes a disk portion configured for supporting an underside of the flange portion. The spacer also includes a hollow cylindrical portion configured to encircle the head portion. The spacer forms a right-angled path between the o-ring and an opening to the processing chamber to prevent direct line-of-sight path between the o-ring and the opening to the processing chamber.
Inventors:
ブース・ジャン−ポール
キール・ダグラス・エル．
キール・ダグラス・エル．
Application Number:
JP2011517512A
Publication Date:
January 28, 2015
Filing Date:
July 07, 2009
Export Citation:
Assignee:
ラム リサーチ コーポレーションＬＡＭ ＲＥＳＥＡＲＣＨ ＣＯＲＰＯＲＡＴＩＯＮ
International Classes:
H05H1/00; H01L21/3065; H05H1/46
Attorney, Agent or Firm:
Patent business corporation Akinari international patent firm