Title:
液処理装置および液処理方法
Document Type and Number:
Japanese Patent JP5667545
Kind Code:
B2
Abstract:
A liquid processing apparatus includes a substrate retaining part that retains a substrate in a horizontal position and rotates the substrate, first and second processing liquid supply nozzles disposed to supply first and second processing liquids, respectively, to the substrate, liquid receiving cups disposed to appropriately position an upper end thereof above the substrate and to receive the first or second processing liquid that has been supplied to the substrate, a first tubular outer cup including an upper opening and disposed around the liquid receiving cup, vertically movable between a lifted position to which the first tubular outer cup is lifted so that its upper end is positioned above the liquid receiving cup, and a lowered position lower than the lifted position, and a second tubular outer cup disposed externally to the first tubular outer cup. The tubular outer cup is selected according to the kind of processing liquid.
Inventors:
伊 藤 規 宏
相 浦 一 博
相 浦 一 博
Application Number:
JP2011232862A
Publication Date:
February 12, 2015
Filing Date:
October 24, 2011
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/027; H01L21/304
Attorney, Agent or Firm:
Katsunuma Hirohito
Hiroyuki Nagai
Katsuomi Isogai
Noted mound 聡
Junpei Okada
Woods Hideyuki
Yukihiro Hotta
Hiroyuki Nagai
Katsuomi Isogai
Noted mound 聡
Junpei Okada
Woods Hideyuki
Yukihiro Hotta