Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
照明光学装置、露光装置、露光方法、およびデバイス製造方法
Document Type and Number:
Japanese Patent JP5668780
Kind Code:
B2
Abstract:
An illumination optical apparatus and projection exposure apparatus capable of reducing a light quantity loss when a mask is illuminated with a polarized illumination light. An illumination optical system (ILS) for illuminating a reticle (R) with an illumination light (IL) and a projection optical system (PL) for projecting the pattern image of the reticle (R) onto a wafer (W) are provided. An illumination light (IL) emitted from an exposure light source (1) in a linearly polarized state in the illumination optical system (ILS) passes through first and second birefringent members (12, 13) having different fast axis directions and is converted into a polarized state that is substantially linearly polarized in a circumferential direction with the optical axis as the center in an almost specific annular area, and them illuminates the reticle (R) under an annular illuminating condition after passing through a fly-eye lens (14).

Inventors:
白石 直正
Application Number:
JP2013089688A
Publication Date:
February 12, 2015
Filing Date:
April 22, 2013
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
株式会社ニコン
International Classes:
H01L21/027; G02B5/30; G02B5/32; G02B19/00; G03F7/20
Attorney, Agent or Firm:
Seiji Ono
Eiryou Kobayashi
Shinji Kato
Mamoru Suzuki
Hiroshi Otani