Title:
クリーニング装置及びクリーニング方法
Document Type and Number:
Japanese Patent JP5685417
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a technology that enables uniform cleaning of a large-sized film-forming mask at high speed and with good efficiency without effecting a film-forming material etc.SOLUTION: A radical ejector 10 is provided in a vacuum tank. The radical ejector 10 performs electric discharge in the cleaning gas supplied from a cleaning gas supply portion 8 and ejects the radicals of the cleaning gas to a mask 6. The radical ejector 10 includes a planar shower plate 15 and a planar mesh member 16. In a plasma forming chamber 18 between the shower plate 15 and the mesh member 16, the plasma of the cleaning gas is generated by applying high frequency power to the shower plate 15 while the shower plate 15 and the mesh member 16 are electrically insulated, and the radicals of the cleaning gas are ejected to the mask 6 from the mesh member 16.
Inventors:
楊 一新
Application Number:
JP2010248843A
Publication Date:
March 18, 2015
Filing Date:
November 05, 2010
Export Citation:
Assignee:
株式会社アルバック
International Classes:
B08B7/00; C23C16/44; H01L51/50; H05B33/10
Attorney, Agent or Firm:
Hideki Abe
Shigeo Ishijima
Shigeo Ishijima