Title:
マイクロリソグラフィ投影露光装置の光学系
Document Type and Number:
Japanese Patent JP5686882
Kind Code:
B2
Abstract:
The system has a mirror arrangement (200) including mirror elements (200a-200c) adjustable independent of each other for changing an angle distribution of light reflected by the mirror arrangement. An overlapping degree between polarization-affecting components (101-103) e.g. Lambda/2-plates, of a polarization-affecting optical arrangement (100) and the mirror arrangement is variably adjustable by displacing the components. A deflection device (300) e.g. prism, includes reflection surfaces (300a, 300b) upstream and downstream of the mirror arrangement relative to a light propagation direction. The mirror arrangement is a micro mirror array. An independent claim is also included for a method for microlithographic manufacturing of microstructured components.
Inventors:
インゴ ゼンガー
Application Number:
JP2013257673A
Publication Date:
March 18, 2015
Filing Date:
December 13, 2013
Export Citation:
Assignee:
カール・ツァイス・エスエムティー・ゲーエムベーハー
International Classes:
H01L21/027; G02B19/00; G03F7/20
Attorney, Agent or Firm:
辻居 Koichi
Sadao Kumakura
Fumiaki Otsuka
Takayoshi Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Shore Yoshinori
Sadao Kumakura
Fumiaki Otsuka
Takayoshi Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Shore Yoshinori