Title:
リソグラフィ装置及びデバイス製造方法
Document Type and Number:
Japanese Patent JP5689535
Kind Code:
B2
Abstract:
A system to control the focus of a mask-less lithographic apparatus, the apparatus including a projection system to project an image of a programmable patterning device onto a substrate. A first actuator system is configured to move at least one of the lenses of the projection system in a direction perpendicular to the optical axis of the projection system. A radiation beam expander is configured to project an image of the programmable patterning device onto the at least one lens. A second actuator system is configured to move the radiation beam expander in a direction parallel to the optical axis of the projection system in order to control the focus of the image projected onto the substrate.
Inventors:
ファン ズウェット、アーウィン
デ ヤーハー、ピーター
オンフリー、ヨハネス
デ マン、ヘンドリック
デ ヤーハー、ピーター
オンフリー、ヨハネス
デ マン、ヘンドリック
Application Number:
JP2013541282A
Publication Date:
March 25, 2015
Filing Date:
November 15, 2011
Export Citation:
Assignee:
エーエスエムエル ネザーランズ ビー．ブイ．
International Classes:
H01L21/027; G03F7/20; H01L21/677
Attorney, Agent or Firm:
Sakaki Morishita