Title:
リソグラフィー用レジスト組成物の製造方法、レジスト保護膜形成用組成物の製造方法、ケイ素含有レジスト下層膜形成用組成物の製造方法、及び有機レジスト下層膜形成用組成物の製造方法
Document Type and Number:
Japanese Patent JP5702699
Kind Code:
B2
Abstract:
The present invention provides a production method of a resist composition for lithography, comprising, at least: a filtering step for filtering a resist composition for lithography by a filter therethrough, wherein in the filtering step, a colloidal, sol is passed through the filter from upstream thereof to adsorb colloidal particles to the filter, and then the resist composition for lithography is passed through the filter, thereby removing fine particles in the resist composition for lithography therefrom. There can be provided a resist composition for lithography capable of decreasing occurrences of defects such as coating defects and pattern defects.
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Inventors:
Motoaki Iwabuchi
Tsutomu Ogiwara
Tsutomu Ogiwara
Application Number:
JP2011234598A
Publication Date:
April 15, 2015
Filing Date:
October 26, 2011
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
H01L21/027; G03F7/26
Domestic Patent References:
| JP2010159399A | ||||
| JP2006136883A | ||||
| JP2003001294A | ||||
| JP2005528206A | ||||
| JP2005058903A | ||||
| JP2003190781A | ||||
| JP2002062667A |
Foreign References:
| US20080135498 |
Attorney, Agent or Firm:
Mikio Yoshimiya