Title:
マイクロレンズアレイを使用したスキャン露光装置
Document Type and Number:
Japanese Patent JP5704525
Kind Code:
B2
Abstract:
A scanning exposure apparatus using microlens arrays, includes a plurality of microlens arrays is arrayed in a direction perpendicular to a scanning direction above a substrate to be exposed, and the microlens arrays are supported on a support substrate. The microlens arrays can be supported on a support substrate so as to be capable of being inclined from a direction parallel to the exposure substrate, relative to the direction in which the microlens arrays are arranged. The inclination angles of these microlens arrays are configured so as to gradually increase or decrease along the arrangement direction.
Inventors:
Mizumura Tsushin
Application Number:
JP2010184457A
Publication Date:
April 22, 2015
Filing Date:
August 19, 2010
Export Citation:
Assignee:
Buoy Technology Co., Ltd.
International Classes:
G03F7/20; H01L21/027
Domestic Patent References:
| JP9244255A | ||||
| JP2007003829A | ||||
| JP2008292916A | ||||
| JP2006191060A | ||||
| JP2005244238A | ||||
| JP2006191031A | ||||
| JP2005317970A | ||||
| JP2011118155A | ||||
| JP2009055060A |
Attorney, Agent or Firm:
Masanori Fujimaki