Title:
露光装置、デバイス製造方法、及び露光方法。
Document Type and Number:
Japanese Patent JP5708546
Kind Code:
B2
Abstract:
An exposure apparatus that by irradiating an exposure light, via a projection optical system and a liquid, on a substrate placed on the image plane side of the projection optical system, exposes the substrate, the exposure apparatus includes: a liquid supply mechanism that supplies the liquid onto the substrate; a liquid recovery mechanism that recovers the liquid having been supplied on the substrate; and wherein when the exposure light is being irradiated on the image plane side of the projection optical system, the liquid recovery mechanism does not perform the recover of the liquid.
Inventors:
Hiroyuki Nagasaka
Yuki Ishii
Susumu Makinouchi
Yuki Ishii
Susumu Makinouchi
Application Number:
JP2012077682A
Publication Date:
April 30, 2015
Filing Date:
March 29, 2012
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
| JP10340846A | ||||
| JP6084757A | ||||
| JP9050955A | ||||
| JP2006510146A |
Foreign References:
| WO1999049504A1 | ||||
| WO2004053955A1 | ||||
| WO2004066371A1 | ||||
| WO2004050266A1 |
Attorney, Agent or Firm:
Seiji Ohno
Kobayashi Hideyoshi
Shinji Kato
Mamoru Suzuki
Hiroshi Otani
Kobayashi Hideyoshi
Shinji Kato
Mamoru Suzuki
Hiroshi Otani