Title:
パターン処理装置及びその方法、プログラム
Document Type and Number:
Japanese Patent JP5709410
Kind Code:
B2
Abstract:
Even when a local area is varied, degradation in recognition accuracy and detection accuracy is suppressed. To that end, a pattern processing apparatus includes a reference local area setting portion 1802 for setting a reference local area based on the detection result of a feature point by a face organ feature point detecting portion 101, a varied local area generating portion 1803 for generating a plurality of varied local area patterns by referring to an image area near the reference local area, a similarity calculating portion 106 for calculating similarities in the reference local areas and in the varied local area patterns between the input pattern and the registered pattern, a representative similarity calculating portion 107 for calculating representative similarity from among the similarities, and a classifying portion 109 for determining a class to which the input pattern belongs.
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Inventors:
Yoshinori Ito
Katsuhiko Mori
Masami Kato
Takahisa Yamamoto
Katsuhiko Mori
Masami Kato
Takahisa Yamamoto
Application Number:
JP2010136066A
Publication Date:
April 30, 2015
Filing Date:
June 15, 2010
Export Citation:
Assignee:
Canon Inc
International Classes:
G06T7/00
Domestic Patent References:
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| JP2005004612A | ||||
| JP2006285944A | ||||
| JP11053525A | ||||
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Attorney, Agent or Firm:
Takuma Abe
Sogo Kuroiwa
Sogo Kuroiwa