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Title:
レジスト組成物、レジストパターン形成方法、高分子化合物
Document Type and Number:
Japanese Patent JP5736189
Kind Code:
B2
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Inventors:
Tomoyuki Hirano
Daishi Shiono
Junichi Tsuchiya
Takagi Daichi
Application Number:
JP2011033629A
Publication Date:
June 17, 2015
Filing Date:
February 18, 2011
Export Citation:
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Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/039; C08F20/28
Domestic Patent References:
JP2009288343A
JP2009062414A
JP2011227405A
JP2008223000A
JP2008292975A
JP2003241385A
JP2008239636A
Foreign References:
WO2008117693A1
Attorney, Agent or Firm:
Sumio Tanai
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi



 
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