Title:
レジスト下層膜材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP5741518
Kind Code:
B2
Inventors:
Jun Hatakeyama
Tsutomu Ogiwara
Seiichiro Tachibana
Tsutomu Ogiwara
Seiichiro Tachibana
Application Number:
JP2012098660A
Publication Date:
July 01, 2015
Filing Date:
April 24, 2012
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/11; G03F7/40; H01L21/027
Domestic Patent References:
| JP2005212093A | ||||
| JP53135336A | ||||
| JP2001072716A | ||||
| JP52146218A | ||||
| JP62178244A | ||||
| JP10226707A |
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
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